There is a wide application for tungsten foil,
which is as target in EOS. Factors influenced the target effect are
thickness, surface condition, density and grain size direction. Mostly,
the purity of foil used for target is 99.90%min, but with density over
19.0g/cm3 to ensure its shielding effect. The surface condition can be
rough, or smooth, but regularly, the most used is electrolytic
polishing.
As heat generator in sapphire growth furnace, after connecting the power, current goes through, with the property of high electricity conductivity, the foil is heating, then the heat is generated.
Contact information:
Email:sales@chinatungsten.com
Tel:86 592 5129696
Fax:86 592 5129797
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